Oxidation-free High Temperature Chamber
Oxidation-free high temperature chamber can prevent products from oxidation under high temperature. It is suitable for application in many industries, such as semiconductors, liquid crystal, electronic products and precision appliance.
Reference Standards- GB/T2423.2-2008 Environmental Testing for Electric and Electronic Products - Part 2: Test B: High Temperature Test Method
- GJB150.3A-2009 Military Equipment Laboratory Environment Test Method Part 3: High Temperature Test
- IEC68-2-2 Test B: Dry heat
Features
- Self-developed temperature controller
- A fuzzy adaptive PID control method, saving energy
- Wide temperature control range
- Small temperature fluctuation and deviation
- Manually adjusted nitrogen flow and display of the float flowmeter scale
- The solenoid valve controls the nitrogen flow to decrease when the temperature is stable (after oxygen content is reached)
- Automatic regulation of inert gas flow by electronic flowmeter software
- Online oxygen concentration analyzer
| Model | | | | | | | |||||||
| Effective Volume (L) | 216 | 512 | 1000 | ||||||||||
| Temp. Range (℃) | Min | RT+30 | |||||||||||
| Max | 250 | 350 | 250 | 350 | 250 | 350 | 250 | 350 | 250 | 350 | 250 | 350 | |
| Temp. uniformity (℃) | ≤1.0 | ||||||||||||
| Temp. fluctuation (℃) | ≤ ±0.5 | ||||||||||||
| Temp. deviation (℃) | ±1.0 | ||||||||||||
| Cooling rate (℃/min) | 250℃ series, no load, from +225 ℃ to +60 ℃, ≤100min | ||||||||||||
| 350℃ series, no load, from +350 ℃ to +60 ℃, ≤180min | |||||||||||||
| Heating rate (℃/min) | no load, from RT+15 ℃ to +200 ℃, ≤60min | ||||||||||||
| Residual oxygen concentration in the chamber | 20 ppm minimum (depending on the purity of inert gas used) | ||||||||||||
| Consumption of high-purity inert gas (N2) when the residual oxygen concentration in the chamber≤100ppm | ≤60L/min (≤40min down to) | ≤120L/min (≤40min down to) | ≤240L/min (≤40min down to) | ||||||||||
| ≤14L/min (concentration maintaining) | ≤28L/min (concentration maintaining) | ≤56L/min (concentration maintaining) | |||||||||||
| Consumption of high-purity inert gas (N2) when the residual oxygen concentration in the chamber≤50ppm | ≤60L/min (≤60min down to) | ≤120L/min (≤60min down to) | ≤240L/min (≤60min down to) | ||||||||||
| ≤20L/min (concentration maintaining) | ≤40L/min (concentration maintaining) | ≤80L/min (concentration maintaining) | |||||||||||
| Internal Dimensions(mm) | W | 600 | 800 | 1000 | |||||||||
| H | 600 | 800 | 1000 | ||||||||||
| D | 600 | 800 | 1000 | ||||||||||
| External dimensions(mm) | W | 860 | 960 | 1100 | 1200 | 1060 | 1160 | 1300 | 1400 | 1260 | 1360 | 1500 | 1600 |
| H | 1430 | 1330 | 1510 | 1610 | 1530 | 1630 | 1710 | 1810 | 1730 | 1830 | 1910 | 2010 | |
| D | 1500 | 1400 | 1600 | 1700 | 1600 | 1700 | 1800 | 1900 | 1800 | 1900 | 2000 | 2100 | |
| Maximum power (not the sum of all power) (KW) | 4.5 | 6.0 | 4.5 | 6.0 | 7.5 | 9.0 | 7.5 | 9.0 | 11.0 | 13.0 | 11.0 | 13.0 | |
| Leakage switch 4P (A) | 16 | 16 | 16 | 16 | 16 | 20 | 16 | 20 | 25 | 25 | 25 | 25 | |
| Noise (dB) | Less than 65 dB (measured 500 mm from the display screen) | ||||||||||||
